Influence of surface oxide of sputtered TaN on displacement plating of Cu

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 4 B, 2003, Pages 1843-1846

  Wang, Zenglin ^a   Sakaue, Hiroyuki ^a   Shingubara, Shoso ^a   Takahagi, Takayuki ^a  

^a HIROSHIMA UNIVERSITY   (Japan)

Author keywords

Displacement plating; Sputtered film; Surface oxidation; TaN film; XPS analysis and redox potentials

Indexed keywords

ARGON; COPPER; ELECTROLESS PLATING; NITROGEN; OXIDATION; PARTIAL PRESSURE; SPUTTERING; SURFACE CHEMISTRY; TANTALUM COMPOUNDS; THICKNESS MEASUREMENT; ULSI CIRCUITS; X RAY PHOTOELECTRON SPECTROSCOPY;

SURFACE OXIDATION; SURFACE OXIDE LAYER; TANTALUM NITRIDE FILM;

THIN FILMS;

EID: 0037672208     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.1843     Document Type: Article

References (16)

1. J. S. H. Chao, H. Kang, S. S. Wong and Y. Shacham-Diamand: MRS Bull. 18 (1993) 31.
2. X. Chen, G. G. Peterson, C. Goldberg, G. Nuesca, H. L. Frisch, B. Arkles and J. Sullivan: J. Mater. Res. 14 (1999) 2043.
3. Y. Shacham-Diamand: Electrochem. Solid-State Lett. 3 (2000) 279.
4. Z. Wang, T. Ida, H. Sawa, H. Sakaue, S. Shingubara and T. Takahagi: Advanced Metallization Conf. 2001, Mater. Res. Soc. Conf. Proc. ULSI-XVII (MRS. Pennsylvania 2002) p. 185.
5. S. Shingubara, Z. Wang, T. Ida, H. Sakaue and T. Talahagi: IEEE Int. Interconnect Conf. 2002 (IITC, Piscataway, NJ, 2002) p. 176.
6. Z. Wang, T. Ida, H. Sakaue, S. Shingubara and T. Takahagi: Electrochem. Solid-State Lett. 6 (2003) C41.
7. H. B. Nie, S. Y. Xu, S. J. Wang, L. P. You, Z. Yang, C. K. Ong, J. Li and T. Y. F. Liew: Appl. Phys. A 73 (2001) 229.
8. J. C. Chuang and M. C. Chen: J. Electrochem. Soc. 145 (1998) 3170.
9. S. Nakao, M. Numata and T. Ohmi: Jpn. J. Appl. Phys. 38 (1999) 2401.
10. G. S. Chen and S. C. Huang: J. Electrochem. Soc. 148 (2001) G424.
11. T. Ono, T. Amazawa, H. Nishimura and S. Matsuo: J. Vac. Sci & Technol. B 17 (1999) 2385.
12. J. C. Lin and C. Lee: J. Electrochem. Soc. 147 (2000) 713.
13. J. C. Lin, G. Chen and C. Lee: J. Electrochem. Soc. 146 (1999) 1835.
14. W. H. Lee, J. C. Lin and C. Lee: Mater. Chem. Phys. 68 (2001) 266.
15. J. Chastain: Handbook of X-ray Photoelectron Spectroscopy, ed. J. Chastain (Perkin-Elmer Corporation, Physical Electronics Division, Eden Prairie, MN, 1992) p. 170.
16. S. I. Raider and R. Flitsh: IBM J. Res. Develop. 22 (1978) 294.