Productivity potential of an inline deposition system for amorphous and microcrystalline silicon solar cells

Solar Energy Materials and Solar Cells

Volumn 93, Issue 9, 2009, Pages 1598-1607

  Strobel, C ^a   Zimmermann, T ^a   Albert, M ^a   Bartha, J W ^a   Kuske, J ^b  

^a DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

^b Forschungs und Applikationslabor Plasmatechnik GmbH   (Germany)

Author keywords

Amorphous; Large area; Microcrystalline; Silicon; Solar cells; VHF PECVD

Indexed keywords

A-SI:H; AMORPHOUS; DEPOSITION SYSTEMS; I-LAYER; IN-LINE; INITIAL EFFICIENCY; LARGE AREA; LINE SOURCES; MICROCRYSTALLINE; NEGATIVE INFLUENCE; PRODUCTIVITY ESTIMATION; SINGLE JUNCTION SOLAR CELLS; SINGLE LAYER; THICKNESS VARIATION; THIN FILM SILICON; UNIFORM DEPOSITION; VHF-PECVD;

CELL MEMBRANES; CYTOLOGY; DEPOSITION; MICROCRYSTALLINE SILICON; PHOTOVOLTAIC CELLS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SOLAR CELLS;

AMORPHOUS SILICON;

EID: 67649404566     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2009.04.023     Document Type: Article

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