Amorphous and microcrystalline silicon solar cells prepared at high deposition rates using RF (13.56 MHz) plasma excitation frequencies

Solar Energy Materials and Solar Cells

Volumn 66, Issue 1-4, 2001, Pages 267-273

  Rech, B ^a   Roschek, T ^a   Muller J ^a   Wieder, S ^a   Wagner, H ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CRYSTALLINE MATERIALS; FILM GROWTH; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILM DEVICES;

DEPOSITION PRESSURE; MICROCRYSTALLINE SILICON; PLASMA EXCITATION FREQUENCIES;

SILICON SOLAR CELLS;

EID: 0035254387     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(00)00183-5     Document Type: Article

References (9)

1. Keppner H., Meier J., Torres P., Fischer D., Shah A. Appl. Phys. A. 69:1999;169.
2. Saito K., Sano M., Matuda K., Kondo T., Nishimoto T., Ogawa K., Kajita I. Schmid J., Ossenbrink H.A., Helm P., Ehmann H., Dunlop E.D. Proceedings of the Second World Conference Photovoltaic Solar Energy Conversion, European Commission. 1998;351-354 Ispra, Italy.
3. K. Yamamoto, M. Yoshimi, Y. Tawada, Y. Okamoto, A. Nakajima, Presented at ICAMS 18, Snowbird, USA, 1999), J. Non-Cryst Solids 266-269 (2000) 1082-1087.
4. Vetterl O., Finger F., Carius R., Hapke P., Houben L., Kluth O., Lambertz A., Mück A., Rech B., Wagner H. Solar Energy Materials & Solar Cells. 62:2000;97.
5. Hapke P., Finger F. J. Non-Cryst. Solids. 227-230:1998;861.
6. Guo L., Kondo M., Fukawa M., Saitoh K., Matsuda A. Jpn. J. Appl. Phys. 37:1998;L1116.
7. T. Takahama, S. Okamoto, N. Ninomiya, M. Nishikuni, N. Nakamura, S. Tsuda, M. Ohnishi, S. Nakano, Y. Kuwano, Technical Digest of the International PVSEC-5, Kyoto, Japan, 1990, pp. 375-378.
8. O. Kluth, A. Löffl, S. Wieder, C. Beneking, W. Appenzeller, L. Houben, B. Rech, H. Wagner, S. Hoffmann, R. Waser, J.A. Anna Selvan, H. Keppner, Proceedings of the 26th IEEE Photovoltaic Specialists Conference, IEEE, Piscataway, 1997, pp. 715-719.
9. B. Rech, H. Wagner, Appl. Phys. A 69 (1999) 155, and references therein.