Preparation of large uniform amorphous silicon films by VHF-PECVD using a ladder-shaped antenna

Thin Solid Films

Volumn 386, Issue 2, 2001, Pages 133-136

  Takeuchi, Yoshiaki ^a   Nawata, Yoshikazu ^a   Ogawa, Kazuhiko ^a   Serizawa, Akira ^a   Yamauchi, Yasuhiro ^a   Murata, Masayoshi ^a  

^a MITSUBISHI HEAVY INDUSTRIES LTD   (Japan)

Author keywords

Amorphous Si films; Deposition; Ladder shaped antenna; VHF PECVD

Indexed keywords

AMORPHOUS SILICON; ELECTROCHEMICAL ELECTRODES; FILM PREPARATION; GLASS; HYDROGENATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILANES; SUBSTRATES;

VERY HIGH FREQUENCY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

AMORPHOUS FILMS;

EID: 0035874148     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01663-1     Document Type: Article

References (10)