High rate growth of micro-crystalline silicon by microwave-PECVD

Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion

Volumn B, Issue , 2003, Pages 1655-1658

  Soppe, W J ^a   Biebericher, A C W ^a   Devilee, C ^a   Donker, H ^b   Schlemm, H ^c  

^a ECN Solar Energy ^*  (Netherlands)

^b DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^c Roth and Rau Oberflachentech AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DARK CONDUCTIVITY; OPTICAL EMISSION SPECTROSCOPY (OES); PLASMA CONDITIONS; TANDEM CELLS;

DEPOSITION; DISSOCIATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PHOTONS; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; THIN FILMS;

SILICON SOLAR CELLS;

EID: 6344289379     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)

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