Thin film silicon alloys with enhanced stability made by PECVD and HWCVD for multibandgap solar cells

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn , Issue , 2005, Pages 1371-1376

  Schropp, Ruud ^a   Franken, Ronald ^a   Gordijn, Aad ^a   Zambrano, Raul Jimenez ^a   Li, Hongbo ^a   Löffler, Jochen ^a   Rath, Jatindra ^a   Stolk, Robert ^a   Van Veen, Marieke ^a   Van Der Werf, Karine ^a  

^a UTRECHT UNIVERSITY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION RATES; MICROCRYSTALLINE MATERIALS; THIN FILM SILICON ALLOYS;

COMPUTER SIMULATION; DEGRADATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; SILICON ALLOYS; SOL-GELS;

THIN FILMS;

EID: 27944482258     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/PVSC.2005.1488396     Document Type: Conference Paper

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