Large area VHF plasma sources

Thin Solid Films

Volumn 502, Issue 1-2, 2006, Pages 50-54

  Takagi, T ^a   Ueda, M ^a   Ito, N ^a   Watabe, Y ^a   Sato, H ^b   Sawaya, K ^b  

^a IHI CORPORATION   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

Author keywords

CVD; Glow discharge; Plasma processing and deposition; Silicon

Indexed keywords

ANTENNA ARRAYS; CRYSTALLINE MATERIALS; NATURAL FREQUENCIES; SILICON; SOLAR CELLS; THIN FILMS;

MULTI-ZONE DEPOSITION; PLASMA PROCESSING AND DEPOSITION; SILICON THIN FILM;

PLASMA SOURCES;

EID: 33344454989     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.07.235     Document Type: Conference Paper

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