Fast deposition of a-Si:H layers and solar cells in a large-area (40x40 cm2) VHF-GD reactor

Materials Research Society Symposium - Proceedings

Volumn 557, Issue , 1999, Pages 121-126

  Kroll, U ^a,b   Fischer, D ^a   Meier, J ^a   Sansonnens, L ^a   Howling, A ^a   Shah, A ^a  

^a UNIVERSITY OF NEUCHÂTEL   (Switzerland)

^b EPFL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC EXCITATION; ELECTRIC REACTORS; ELECTRODES; FREQUENCIES; HYDROGEN; INTERFEROMETRY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; SEMICONDUCTOR DOPING; SOLAR CELLS; THICK FILMS; VOLTAGE MEASUREMENT;

FILM THICKNESS; HYDROGENATED AMORPHOUS SILICON; PLASMA EXCITATION;

AMORPHOUS SILICON;

EID: 0033298867     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (11)

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9. J. Meot; private communication.
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