Microcrystalline silicon solar cells fabricated using array-antenna-type very high frequency plasma-enhanced chemical vapor deposition system

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 5 A, 2006, Pages 4003-4005

  Takagi, Tomoko ^a,b   Ueda, Masashi ^b   Ito, Norikazu ^b   Watabe, Yoshimi ^b   Kondo, Michio ^a,c  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b IHI CORPORATION   (Japan)

^c NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Large area deposition; Microcrystalline silicon; Plasma enhanced chemical vapor deposition; Solar cell; Thin film silicon; VHP

Indexed keywords

ANTENNAS; CRYSTALLINE MATERIALS; DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; QUANTUM EFFICIENCY; THIN FILM DEVICES;

LARGE-AREA DEPOSITION; MICROCRYSTALLINE SILICON; PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION; THIN-FILM SILICON; VHP;

SOLAR CELLS;

EID: 33646887787     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.4003     Document Type: Article

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