Low temperature growth of microcrystalline silicon and its application to solar cells

Thin Solid Films

Volumn 383, Issue 1-2, 2001, Pages 1-6

  Kondo, Michio ^a   Matsuda, Akihisa ^a  

^a ELECTROTECHNICAL LABORATORY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ENERGY GAP; EPITAXIAL GROWTH; HYDRANTS; HYDROGEN; ION BOMBARDMENT; LOW TEMPERATURE EFFECTS; NANOSTRUCTURED MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTOR GROWTH; SILANES; SOLAR CELLS;

HIGH PRESSURE DEPLETION METHOD; MICROCRYSTALLINE SILICON;

SEMICONDUCTING SILICON;

EID: 0035246793     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01789-2     Document Type: Article

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