Fast inverse lithography technology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6154 II, Issue , 2006, Pages

  Abrams, Daniel S ^a   Pang, Linyong ^a  

^a Luminescent Technologies Inc   (United States)

Author keywords

ILT; Inverse lithography; Inverse problem; Lithography simulation; OPC; Optimization; Process window; PSM; Yield

Indexed keywords

COMPUTER SIMULATION; CONSTRAINT THEORY; INVERSE PROBLEMS; MASKS; OPTIMIZATION;

ILT; INVERSE LITHOGRAPHY; LITHOGRAPHY SIMULATION; OPC; PROCESS WINDOW; PSM; YIELD;

LITHOGRAPHY;

EID: 33745777156     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.658876     Document Type: Conference Paper

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