Solving inverse problems of optical microlithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5754, Issue PART 1, 2005, Pages 506-526

  Granik, Yuri ^a  

^a MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

Illuminator optimization; OPC; Optical lithography; Optical proximity correction; Resolution enhancement techniques; RET

Indexed keywords

ILLUMINATOR OPTIMIZATION; OPC; RESOLUTION ENHANCEMENT TECHNIQUES; RET;

ALGORITHMS; ELECTRIC FIELDS; IMAGE PROCESSING; IMAGING SYSTEMS; INVERSE PROBLEMS; MASKS; NONLINEAR SYSTEMS; OPTIMIZATION; PROBLEM SOLVING;

PHOTOLITHOGRAPHY;

EID: 25144486100     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600141     Document Type: Conference Paper

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