Layer specific illumination optimization by Monte Carlo method

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5040 I, Issue , 2003, Pages 244-250

  Kim, Hochul ^a   Nam, Dongseok ^a   Hwang, Chan ^a   Kang, Young S ^a   Woo, Sang Gyun ^a   Cho, Han Ku ^a   Han, Woo Sung ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

Layer specific illumination; Monte Carlo method; Spectrum analysis

Indexed keywords

COMPUTER SIMULATION; DIFFRACTION GRATINGS; DYNAMIC RANDOM ACCESS STORAGE; IMAGE ENHANCEMENT; LIGHTING; MONTE CARLO METHODS; OPTIMIZATION; SPECTRUM ANALYSIS;

DIFFRACTED BEAM; IMAGE FITNESS;

PHOTOLITHOGRAPHY;

EID: 0141610767     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485383     Document Type: Conference Paper

References (1)

1. Young-Seog Kang, "Process latitude extension in low k1 DRAM lithography using specific layer oriented illumination design", SPIE Feb. 2003