Model-based scattering bars implementation for 65nm and 45nm nodes using IML™ technology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5853 PART II, Issue , 2005, Pages 659-671

  Hsu, Michael ^a   Van Den Broeke, Doug ^a   Laidig, Tom ^a   Wampler, Kurt E ^a   Hollerbach, Uwe ^a   Socha, Robert ^a   Fung Chen, J ^a   Hsu, Stephen ^a   Shi, Xuelong ^a  

^a ASML US Inc   (United States)

Author keywords

CPL; Diffraction Optical Element; DOE; IML Technology; LithoCruiser ; MaskWeaver ; Model based SB; SB; Scattering Bars; SLiC

Indexed keywords

DIFFRACTION; INTEGRATED CIRCUIT LAYOUT; MICROPROCESSOR CHIPS; OPTICAL DEVICES;

CPL; DIFFRACTION OPTICAL ELEMENT; SCATTERING BARS (SB);

LITHOGRAPHY;

EID: 28544433420     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.617165     Document Type: Conference Paper

References (4)

1. C.W. Michael Hsu et.al., "Lithography Manufacturing Implementation for 65nm and 45nm Nodes with Model-Based Scattering Bars Using IML™ Technology", SPIE Vol. 5754, 2005
2. Doug van den Broeke et.al., "Near 0.3 k1 full pitch contact hole patterning using chromeless phase lithography (CPL)", SPIE Vol. 5256, pp 297-308, 2003
3. Doug van den Broeke et.al., "Application of CPL with interference Mapping Lithography to Generate Random Contact Reticle Designs for the 65nm Node", SPIE Vol. 5446, pp 550-559, 2004
4. Robert Socha et.al., "Contact Hole Reticle Optimization by Using Interference Mapping Lithography (IML)", SPIE Vol. 5446, pp 516-534, 2004