OPC and PSM design using inverse lithography: A non-linear optimization approach

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6154 III, Issue , 2006, Pages

  Poonawala, Amyn ^a   Milanfar, Peyman ^a  

^a University of California Santa Cruz   (United States)

Author keywords

Inverse lithography; Low complexity; Non linear programming; OPC; Optimization; Pixel based approach; PSM; Regularization

Indexed keywords

ALGORITHMS; COMPUTATIONAL COMPLEXITY; IMAGING TECHNIQUES; INVERSE KINEMATICS; ITERATIVE METHODS; PARAMETER ESTIMATION;

INVERSE LITHOGRAPHY; LOW-COMPLEXITY; NON-LINEAR PROGRAMMING; OPC; PIXEL-BASED APPROACH; PSM;

PHOTOLITHOGRAPHY;

EID: 33745766645     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.655904     Document Type: Conference Paper

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