Illumination optimization of periodic patterns for maximum process window

Microelectronic Engineering

Volumn 61-62, Issue , 2002, Pages 57-64

  Socha, Robert ^a,b   Eurlings, Mark ^a   Nowak, Frank ^a   Finders, Jo ^a  

^a ASML   (Netherlands)

^b ASML US Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTATIONAL METHODS; COMPUTER SIMULATION; DYNAMIC RANDOM ACCESS STORAGE; OPTIMIZATION;

DIPOLE MOMENT; ILLUMINATION OPTIMIZATION;

MICROELECTRONICS;

EID: 0036643688     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(02)00516-6     Document Type: Conference Paper

References (5)

1. Illuminator design for the printing of regular contact patterns
2. The customized illumination aperture filter for low k1 photolithography process
3. Optimum mask and source patterns to print a given shape
4. Lumped parameter model of the photolithographic process