메뉴 건너뛰기




Volumn 18, Issue 11, 2008, Pages

Self-sacrificial surface micromachining using poly(methyl methacrylate)

Author keywords

[No Author keywords available]

Indexed keywords

BUILDING MATERIALS; COMPOSITE MICROMECHANICS; ESTERS; MACHINING; MICROMACHINING; MOLECULAR WEIGHT; SURFACE MICROMACHINING;

EID: 58149356985     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/18/11/115012     Document Type: Article
Times cited : (5)

References (42)
  • 1
    • 0000364231 scopus 로고
    • Surface micromachining for microsensors and microactuators
    • Howe R T 1988 Surface micromachining for microsensors and microactuators J. Vac. Sci. Technol. B 6 1809-13
    • (1988) J. Vac. Sci. Technol. , vol.6 , Issue.6 , pp. 1809-1813
    • Howe, R.T.1
  • 3
    • 0032138470 scopus 로고    scopus 로고
    • Surface micromachining for microelectromechanical systems
    • Bustillo J M, Howe R T and Muller R S 1998 Surface micromachining for microelectromechanical systems Proc. IEEE 86 1552-74
    • (1998) Proc. IEEE , vol.86 , Issue.8 , pp. 1552-1574
    • Bustillo, J.M.1    Howe, R.T.2    Muller, R.S.3
  • 6
    • 0029418972 scopus 로고
    • Design techniques for surface-micromachining mems processes
    • Comtois J H and Bright V M 1995 Design techniques for surface-micromachining mems processes Proc. SPIE 2639 211-22
    • (1995) Proc. SPIE , vol.2639 , pp. 211-222
    • Comtois, J.H.1    Bright, V.M.2
  • 7
    • 0016574277 scopus 로고
    • Deep-UV lithography
    • Lin B J 1975 Deep-UV lithography J. Vac. Sci. Technol. 12 1317-20
    • (1975) J. Vac. Sci. Technol. , vol.12 , Issue.6 , pp. 1317-1320
    • Lin, B.J.1
  • 8
    • 0001254474 scopus 로고
    • Characterization of a dissociative excited state in the solid state: Photochemistry of poly(methy1 methacrylate). Photochemical processes in polymeric systems. 5
    • Gupta A, Liang R, Tsay F D and Moacanin J 1980 Characterization of a dissociative excited state in the solid state: photochemistry of poly(methy1 methacrylate). Photochemical processes in polymeric systems. 5 Macromolecules 13 1696-700
    • (1980) Macromolecules , vol.13 , Issue.6 , pp. 1696-1700
    • Gupta, A.1    Liang, R.2    Tsay, F.D.3    Moacanin, J.4
  • 10
    • 41549112896 scopus 로고    scopus 로고
    • Deep-UV exposure of poly(methyl methacrylate) at 254 nm using low-pressure mercury vapour lamps
    • Johnstone R W, Foulds I G and Parameswaran M 2008 Deep-UV exposure of poly(methyl methacrylate) at 254 nm using low-pressure mercury vapour lamps J. Vac. Sci. Technol. B 26 682-5
    • (2008) J. Vac. Sci. Technol. , vol.26 , Issue.2 , pp. 682-685
    • Johnstone, R.W.1    Foulds, I.G.2    Parameswaran, M.3
  • 11
    • 0036692639 scopus 로고    scopus 로고
    • SU8-micromechanical structures with in situ fabricated movable parts
    • Seidemann V, Rabe J, Feldmann M and Büttgenbach S 2002 SU8-micromechanical structures with in situ fabricated movable parts Microsyst. Technol. 8 348-50
    • (2002) Microsyst. Technol. , vol.8 , Issue.4-5 , pp. 348-350
    • Seidemann, V.1    Rabe, J.2    Feldmann, M.3    Büttgenbach, S.4
  • 12
    • 0036544018 scopus 로고    scopus 로고
    • Fabrication and investigation of in-plane compliant SU8 structures for mems and their application to micro valves and micro grippers
    • Seidemann V, Bütefisch S and Büttgenbach S 2002 Fabrication and investigation of in-plane compliant SU8 structures for mems and their application to micro valves and micro grippers Sensors Actuators A 97-8 457-61
    • (2002) Sensors Actuators , vol.97-98 , Issue.1-2 , pp. 457-461
    • Seidemann, V.1    Bütefisch, S.2    Büttgenbach, S.3
  • 13
    • 3042739420 scopus 로고    scopus 로고
    • Microfabrication of three-dimensional photoresist structures using selective patterning and development on two types of specific resists and its application to microfluidic components
    • Yun K-S and Yoon E 2004 Microfabrication of three-dimensional photoresist structures using selective patterning and development on two types of specific resists and its application to microfluidic components Micro Electro Mechanical Systems, 2004. 17th IEEE Int. Conf. on. (MEMS) pp 757-60
    • (2004) Micro Electro Mechanical Systems, 2004. 17th IEEE Int. Conf. On. (MEMS) , pp. 757-760
    • Yun, K.-S.1    Yoon, E.2
  • 14
    • 18744399272 scopus 로고    scopus 로고
    • Multi-layer SU-8 lift-off technology for microfluidic devices
    • Bohl B, Steger R, Zengerle R and Koltay P 2005 Multi-layer SU-8 lift-off technology for microfluidic devices J. Micromech. Microeng. 15 1125-30
    • (2005) J. Micromech. Microeng. , vol.15 , Issue.6 , pp. 1125-1130
    • Bohl, B.1    Steger, R.2    Zengerle, R.3    Koltay, P.4
  • 15
    • 33847358620 scopus 로고    scopus 로고
    • Polymer mems processing for multi-user applications
    • Sameoto D, Tsang S-H and Parameswaran M 2007 Polymer mems processing for multi-user applications Sensors Actuators A 134 457-64
    • (2007) Sensors Actuators , vol.134 , Issue.2 , pp. 457-464
    • Sameoto, D.1    Tsang, S.-H.2    Parameswaran, M.3
  • 17
    • 0035124001 scopus 로고    scopus 로고
    • A novel micro-machining method for the fabrication of thick-film su-8 embedded micro-channels
    • Fay F E H, Kan J A, Watt F and Choong W O 2001 A novel micro-machining method for the fabrication of thick-film su-8 embedded micro-channels J. Micromech. Microeng. 11 27-32
    • (2001) J. Micromech. Microeng. , vol.11 , Issue.1 , pp. 27-32
    • Fay, F.E.H.1    Kan, J.A.2    Watt, F.3    Choong, W.O.4
  • 18
  • 19
    • 0037438784 scopus 로고    scopus 로고
    • A novel fabrication method of embedded micro-channels by using su-8 thick-film photoresists
    • Chuang Y-J, Tseng F G, Cheng J-H and Lin W-K 2003 A novel fabrication method of embedded micro-channels by using su-8 thick-film photoresists Sensors Actuators A 103 64-9
    • (2003) Sensors Actuators , vol.103 , Issue.1-2 , pp. 64-69
    • Chuang, Y.-J.1    Tseng, F.G.2    Cheng, J.-H.3    Lin, W.-K.4
  • 20
    • 33845805293 scopus 로고    scopus 로고
    • In situ fabrication of su-8 movable parts by using PAG-diluted su-8 as the sacrificial layer
    • Ling Z and Lian K 2007 In situ fabrication of su-8 movable parts by using PAG-diluted su-8 as the sacrificial layer Microsyst. Technol. 13 253-7
    • (2007) Microsyst. Technol. , vol.13 , Issue.3-4 , pp. 253-257
    • Ling, Z.1    Lian, K.2
  • 22
    • 0033344838 scopus 로고    scopus 로고
    • Micro-stereolithography of polymeric and ceramic microstructures
    • Zhang X, Jiang X N and Sun C 1999 Micro-stereolithography of polymeric and ceramic microstructures Sensors Actuators A 77 149-56
    • (1999) Sensors Actuators , vol.77 , Issue.2 , pp. 149-156
    • Zhang, X.1    Jiang, X.N.2    Sun, C.3
  • 24
    • 0037103906 scopus 로고    scopus 로고
    • Submicron stereolithography for the production of freely movable mechanisms by using single-photon polymerization
    • Maruo S and Ikuta K 2002 Submicron stereolithography for the production of freely movable mechanisms by using single-photon polymerization Sensors Actuators A 100 70-6
    • (2002) Sensors Actuators , vol.100 , Issue.1 , pp. 70-76
    • Maruo, S.1    Ikuta, K.2
  • 26
    • 0038346507 scopus 로고    scopus 로고
    • Stereolithography on silicon for microfluidics and microsensor packaging
    • Tse L A, Hesketh P J, Rosen D W and Gole J L 2003 Stereolithography on silicon for microfluidics and microsensor packaging Microsyst. Technol. 9 319-23
    • (2003) Microsyst. Technol. , vol.9 , Issue.5 , pp. 319-323
    • Tse, L.A.1    Hesketh, P.J.2    Rosen, D.W.3    Gole, J.L.4
  • 27
    • 10644225442 scopus 로고    scopus 로고
    • Robust polymer microfluidic device fabrication via contact liquid photolithographic polymerization (clipp)
    • Hutchison J B, Haraldsson K T, Good B T, Sebra R P, Luo N, Anseth K S and Bowman C N 2004 Robust polymer microfluidic device fabrication via contact liquid photolithographic polymerization (clipp) Lab Chip 4 658-62
    • (2004) Lab Chip , vol.4 , Issue.6 , pp. 658-662
    • Hutchison, J.B.1    Haraldsson, K.T.2    Good, B.T.3    Sebra, R.P.4    Luo, N.5    Anseth, K.S.6    Bowman, C.N.7
  • 30
    • 33748806603 scopus 로고    scopus 로고
    • A planar self-sacrificial multilayer su-8-based mems process utilizing a UV-blocking layer for the creation of freely moving parts
    • Foulds I G and Parameswaran M 2006 A planar self-sacrificial multilayer su-8-based mems process utilizing a UV-blocking layer for the creation of freely moving parts J. Micromech. Microeng. 16 2109-15
    • (2006) J. Micromech. Microeng. , vol.16 , Issue.10 , pp. 2109-2115
    • Foulds, I.G.1    Parameswaran, M.2
  • 33
    • 37649026682 scopus 로고    scopus 로고
    • Evolution of wrinkles in hard films on soft substrates
    • Huang Z, Hong W and Suo Z 2004 Evolution of wrinkles in hard films on soft substrates Phys. Rev. E 70 030601 (4pp)
    • (2004) Phys. Rev. , vol.70 , Issue.3 , pp. 030601
    • Huang, Z.1    Hong, W.2    Suo, Z.3
  • 34
    • 21844432711 scopus 로고    scopus 로고
    • Nonlinear analyses of wrinkles in a film bonded to a compliant substrate
    • Huang Z Y, Hong W and Suo Z 2005 Nonlinear analyses of wrinkles in a film bonded to a compliant substrate J. Mech. Phys. Solids 53 2101-18
    • (2005) J. Mech. Phys. Solids , vol.53 , Issue.9 , pp. 2101-2118
    • Huang, Z.Y.1    Hong, W.2    Suo, Z.3
  • 36
    • 0017943987 scopus 로고
    • A study on the dissolution rate of irradiated poly(methyl methacrylate)
    • Ouano A C 1978 A study on the dissolution rate of irradiated poly(methyl methacrylate) Polym. Sci. Eng. 18 306-13
    • (1978) Polym. Sci. Eng. , vol.18 , Issue.4 , pp. 306-313
    • Ouano, A.C.1
  • 37
    • 0024130417 scopus 로고
    • Enhanced sensitivity in the electron beam resist poly(methyl methacrylate) using improved solvent developer
    • Mohsin M A and Cowie M G 1988 Enhanced sensitivity in the electron beam resist poly(methyl methacrylate) using improved solvent developer Polymer 29 2130-5
    • (1988) Polymer , vol.29 , Issue.12 , pp. 2130-2135
    • Mohsin, M.A.1    Cowie, M.G.2
  • 38
    • 0023401312 scopus 로고
    • Alcohol-water cosolvent systems for poly(methyl methacrylate)
    • Cowie J M G, Mohsin M A and McEwen I J 1987 Alcohol-water cosolvent systems for poly(methyl methacrylate) Polymer 28 1569-72
    • (1987) Polymer , vol.28 , Issue.9 , pp. 1569-1572
    • Cowie, J.M.G.1    Mohsin, M.A.2    McEwen, I.J.3
  • 39
    • 0035971781 scopus 로고    scopus 로고
    • Fabrication of !5 nm width lines in poly(methylmethacrylate) resist using a water:isopropyl alcohol developer and ultrasonically- assisted development
    • Yasin S, Hasko D G and Ahmed H 2001 Fabrication of !5 nm width lines in poly(methylmethacrylate) resist using a water:isopropyl alcohol developer and ultrasonically- assisted development Appl. Phys. Lett. 78 2760-2
    • (2001) Appl. Phys. Lett. , vol.78 , Issue.18 , pp. 2760-2762
    • Yasin, S.1    Hasko, D.G.2    Ahmed, H.3
  • 40
    • 0036643928 scopus 로고    scopus 로고
    • Comparison of MIBK/IPA and water/IPA as PMMA developers for electron beam nanolithography
    • Yasin S, Hasko D G and Ahmed H 2002 Comparison of MIBK/IPA and water/IPA as PMMA developers for electron beam nanolithography Microelectron. Eng. 61-62 745-53
    • (2002) Microelectron. Eng. , vol.61-62 , Issue.1-3 , pp. 745-753
    • Yasin, S.1    Hasko, D.G.2    Ahmed, H.3
  • 41
    • 22144459773 scopus 로고    scopus 로고
    • On the stiction of mems materials
    • Zhuang Y X and Menon A 2005 On the stiction of mems materials Tribol. Lett. 19 111-7
    • (2005) Tribol. Lett. , vol.19 , Issue.2 , pp. 111-117
    • Zhuang, Y.X.1    Menon, A.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.