Multi-layer enhancement to polysilicon surface-micromachining technology

Technical Digest - International Electron Devices Meeting, IEDM

Volumn , Issue , 1997, Pages 903-906

  Sniegowski, J J ^a   Rodgers, M S ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL MECHANICAL POLISHING (CMP); MECHANICAL FILMS; MULTILAYER SURFACE MICROMACHINING TECHNOLOGY; SURFACE TOPOGRAPHY;

ANNEALING; CHEMICAL POLISHING; DEPOSITION; MICROMACHINING; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING SILICON;

MICROELECTROMECHANICAL DEVICES;

EID: 84886448140     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (14)