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Volumn , Issue , 1997, Pages 903-906
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Multi-layer enhancement to polysilicon surface-micromachining technology
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL MECHANICAL POLISHING (CMP);
MECHANICAL FILMS;
MULTILAYER SURFACE MICROMACHINING TECHNOLOGY;
SURFACE TOPOGRAPHY;
ANNEALING;
CHEMICAL POLISHING;
DEPOSITION;
MICROMACHINING;
POLYCRYSTALLINE MATERIALS;
SEMICONDUCTING SILICON;
MICROELECTROMECHANICAL DEVICES;
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EID: 84886448140
PISSN: 01631918
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (32)
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References (14)
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