Microfabrication of channels using an embedded mask in negative resist

Journal of Micromechanics and Microengineering

Volumn 11, Issue 6, 2001, Pages 703-705

  Alderman, B E J ^a   Mann, C M ^b   Steenson, D P ^a   Chamberlain, J M ^a  

^a UNIVERSITY OF LEEDS   (United Kingdom)

^b RUTHERFORD APPLETON LABORATORY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

PHOTORESISTS; ULTRAVIOLET RADIATION; WAVE FILTERS; WAVEGUIDES;

MULTIPLE CROSSING CHANNELS;

MASKS;

EID: 0035505922     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/11/6/312     Document Type: Article

References (5)

1. Fabrication and characterisation of an integrated waveguide for use at G-band
2. SU-8: A low-cost negative resist for MEMS
3. A new micro-machined millimeter-wave and terahertz snap-together rectangular waveguide technology
4. An embedded mask for application in high-frequency integrated circuits using UV positive resist technology
5. Negative photoresists for optical lithography