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Microelectronic Engineering

Volumn 61-62, Issue , 2002, Pages 745-753

Comparison of MIBK/IPA and water/IPA as PMMA developers for electron beam nanolithography

(3) Yasin, Shazia a Hasko, D G a Ahmed, H a

a UNIVERSITY OF CAMBRIDGE (United Kingdom)

Author keywords

Developer; Electron beam lithography; Ultrasonically assisted development

Indexed keywords

DIFFRACTION GRATINGS; ELECTRON BEAM LITHOGRAPHY; PHOTORESISTS; POLYMETHYL METHACRYLATES; SENSITIVITY ANALYSIS;

ELECTRON BEAM NANOLITHOGRAPHY;

NANOTECHNOLOGY;

EID: 0036643928 PISSN: 01679317 EISSN: None Source Type: Journal
DOI: 10.1016/S0167-9317(02)00468-9 Document Type: Conference Paper

Times cited : (102)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.