SCOPUS 정보 검색 플랫폼

Materials Research Society Symposium - Proceedings

Volumn 705, Issue , 2002, Pages 91-100

EUV lithography: Patterning to the end of the road

(4) Cobb, Jonathan L a Brainard, Robert L a O'Connell, Donna J a Dentinger, Paul M a

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; LEAKAGE CURRENTS; PHOTONS; PHOTORESISTS; SCANNING ELECTRON MICROSCOPY; STATISTICAL METHODS; SURFACE ROUGHNESS; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY; EXTREME ULTRAVIOLET PHOTON; LINE EDGE ROUGHNESS; PATTERNING TECHNOLOGY;

NANOTECHNOLOGY;

EID: 0036350234 PISSN: 02729172 EISSN: None Source Type: Journal
DOI: None Document Type: Article

Times cited : (19)

References (20)

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