Deprotonation mechanism of poly(4-hydroxystyrene) and its derivative

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5753, Issue II, 2005, Pages 1034-1039

  Nakano, Atsuro ^a   Okamoto, Kazumasa ^a   Yamamoto, Yukio ^a   Kozawa, Takahiro ^a   Tagawa, Seiichi ^a   Kai, Toshiyuki ^b   Nemoto, Hiroaki ^b   Shimokawa, Tsutomu ^b  

^a OSAKA UNIVERSITY   (Japan)

^b JSR CORPORATION   (Japan)

Author keywords

Acid generation mechanism; Deprotonation; Electron beam; EUV; Poly(4 hydroxystyrene)

Indexed keywords

DERIVATIVES; MOLECULAR DYNAMICS; PHOTOLITHOGRAPHY; PROTECTIVE COATINGS; REACTION KINETICS; SENSITIVITY ANALYSIS; SURFACE TOPOGRAPHY;

DEPROTONATION MECHANISM; NANOSCALE TOPOGRAPHY; POST-OPTICAL LITHOGRAPHY; REACTION MECHANISM;

POLYSTYRENES;

EID: 24644433773     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.596827     Document Type: Conference Paper

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