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Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4345, Issue I, 2001, Pages 106-118

Comparison of acid generating efficiencies in 248 and 193 nm photoresists

(4) Cameron, J F a Chan, N a Moore, K a Pohlers, G a

Author keywords

Acid generating efficiency; Acid quantification; C parameter; Deep UV and 193 nm chemically amplified resists; Photoacid generator; Quantum yield; Sensitization

Indexed keywords

ACIDS; AROMATIC COMPOUNDS; CHROMOPHORES; IMAGING SYSTEMS; INTEGRATED CIRCUITS; TERPOLYMERS;

PHOTO ACID GENERATORS (PAG);

PHOTORESISTS;

EID: 0034776763 PISSN: 0277786X EISSN: None Source Type: Conference Proceeding
DOI: 10.1117/12.436838 Document Type: Conference Paper

Times cited : (46)

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