Changes in resist glass transition temperatures due to exposure

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6519, Issue PART 1, 2007, Pages

  Fedynyshyn, Theodore H ^a   Pottebaum, Indira ^a   Cabral, Alberto ^a   Roberts, Jeanette ^b  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

Glass transition temperature; Linewidth roughness; PAG; Photoresist; Polymer

Indexed keywords

BAKE TEMPERATURES; INTRINSIC MATERIAL ROUGHNESS (IMR); LINEWIDTH ROUGHNESS; THERMAL POLYMER DEPROTECTION;

CONDUCTING POLYMERS; PHOTORESISTORS; SURFACE ROUGHNESS;

GLASS TRANSITION;

EID: 35148900276     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.713886     Document Type: Conference Paper

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