Component segregation in model chemically amplified resists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6519, Issue PART 1, 2007, Pages

  Woodward, John T ^a   Fedynyshyn, Theodore H ^b   Astolfi, David K ^b   Cann, Susan ^b   Roberts, Jeanette M ^c   Leeson, Michael J ^c  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b MIT LINCOLN LABORATORY   (United States)

^c INTEL CORPORATION   (United States)

Author keywords

Atomic force microscopy; Chemical force microscopy; Line edge roughness; PAG; Photoresist

Indexed keywords

CHEMICAL FORCE MICROSCOPY; INNATE MATERIAL ROUGHNESS; LINE EDGE ROUGHNESS; PHOTOACID GENERATOR (PAG); POST EXPOSURE BAKE (PEB);

EDGE DETECTION; EXTREME ULTRAVIOLET LITHOGRAPHY; FILMS; MICROSCOPIC EXAMINATION; SURFACE ROUGHNESS;

PHOTORESISTS;

EID: 35148867133     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711152     Document Type: Conference Paper

References (7)

1. Fedynyshyn, T. H., Pottebaum, I., Astolfi, D. K., Cabral, A., Roberts, J., and Meagley, R., "Contribution of Photoacid Generator to Material Roughness" Journal of Vacuum Science and Technology B 24, 3031-3039, 2006.
2. Fedynyshyn, T. H., Sinta, R. F., Astolfi, D. K., Cabral, A., Robert, J., and Meagley, R., "Deconstructing the Resist to Probe Innate Material Roughness" Proceeding of SPIE 6153, 615315, 2006.
3. Fedynyshyn, T. H., Astolfi, D. K., Cabral, A., and Roberts, J., "PAG Segregation During Exposure Affecting Innate Material Roughness" Proceeding of SPIE 6519, 2007.
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6. Woodward, J. T. and Solak, H. H., "Chemical Force Microscopy of 30 nm Half-Pitch Latent Images in Poly(Methyl-Methacrylate)" To be published.
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