Calibration of EUV-2D photoresist simulation parameters for accurate predictive modelling

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 II, Issue , 2003, Pages 900-909

  Robertson, Stewart A ^a   Naulleau, Patrick P ^b   O'Connell, Donna J ^c   McDonald, Kevin ^c   Delano, Todd ^a   Goldberg, Kenneth A ^b   Hansen, Steven G ^d   Brown, Kirk W ^a   Brainard, Robert L ^a  

^a SHIPLEY COMPANY   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^c SANDIA NATIONAL LABORATORIES   (United States)

^d ASML US Inc   (United States)

Author keywords

Extreme ultraviolet lithography; Lithography simulation; Modelling parameter optimization

Indexed keywords

CALIBRATION; COMPUTER AIDED SOFTWARE ENGINEERING; COMPUTER SIMULATION; OPTICS; OPTIMIZATION; PARAMETER ESTIMATION; PHOTORESISTS; PROJECTION SYSTEMS; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY; LENS ABBERATIONS; PARAMETER OPTIMIZATION; PROJECTION OPTICS; SUBFIELD EXPOSURE STATION;

LITHOGRAPHY;

EID: 0141724634     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.499357     Document Type: Conference Paper

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