Radiation and photochemistry of onium salt acid generators in chemically amplified resists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3999, Issue , 2000, Pages

  Tagawa, Seiichi ^a   Nagahara, Seiji ^a   Iwamoto, Toshiyuki ^a   Wakita, Masanori ^a   Kozawa, Takahiro ^a   Yamamoto, Yukio ^a   Werst, David ^a   Trifunac, Alexander D ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; EXCIMER LASERS; LASER BEAM EFFECTS; PHOTOLYSIS; RADIATION CHEMISTRY; SALTS;

CHEMICALLY AMPLIFIED RESISTS; FLASH PHOTOLYSIS; PULSE RADIOLYSIS; SULFONIUM SALTS;

PHOTORESISTS;

EID: 0033690836     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (22)