Lactones in 193 nm resists: What do they do?

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6923, Issue , 2008, Pages

  Ito, Hiroshi ^a   Truong, Hoa D ^a   Brock, Phil J ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

193 nm resists; Deprotection; Ethylcyclooctyl methacrylate; Ethylcyclopentyl methacrylate; Hexafluoroalcohol; Hydrogen bonding; Infrared spectroscopy; Lactones; Methyladamantyl methacrylate; Photochemical acid generator; Quartz crystal microbalance; Thermal gradient plate

Indexed keywords

ACIDS; ACTIVATION ENERGY; ANODIC OXIDATION; BONDING; DIFFRACTIVE OPTICAL ELEMENTS; DISSOLUTION; ESTERS; GRAVIMETRIC ANALYSIS; HYDROGEN; HYDROGEN BONDS; IMAGE SEGMENTATION; INFRARED SPECTROSCOPY; OXIDE MINERALS; PHOTORESISTS; POLYMERS; QUARTZ; QUARTZ CRYSTAL MICROBALANCES; SPECTROSCOPIC ANALYSIS; THERMOANALYSIS; THERMOGRAVIMETRIC ANALYSIS;

193 NM RESISTS; DEPROTECTION; ETHYLCYCLOOCTYL METHACRYLATE; ETHYLCYCLOPENTYL METHACRYLATE; HEXAFLUOROALCOHOL; HYDROGEN BONDING; LACTONES; METHYLADAMANTYL METHACRYLATE; PHOTOCHEMICAL ACID GENERATOR; QUARTZ CRYSTAL MICROBALANCE;

POLYACRYLATES;

EID: 51549115632     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772919     Document Type: Conference Paper

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