Optical and chemical characterization of expanding thermal plasma-deposited carbon-containing silicon dioxide-like films

Thin Solid Films

Volumn 516, Issue 23, 2008, Pages 8547-8553

  Creatore, M ^a   Rieter, S M ^a   Barrell, Y ^a   van de Sanden, M C M ^a   Vernhes, R ^b   Martinu, L ^b  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b ÉCOLE POLYTECHNIQUE DE MONTRÉAL   (Canada)

Author keywords

Chemical vapor deposition (CVD); Ellipsometry; Fourier transform infrared spectroscopy (FTIR); Silicon oxide

Indexed keywords

CHEMICAL PROPERTIES; NONMETALS; OPTICAL PROPERTIES; SEMICONDUCTING CADMIUM TELLURIDE; SILICA; SILICON CARBIDE;

CHEMICAL CHARACTERIZATION; CHEMICAL COMPOSITIONS; CHEMICAL VAPOR DEPOSITION (CVD); DEPOSITED CARBON; ELLIPSOMETRY; EXPANDING THERMAL PLASMA; FOURIER TRANSFORM INFRARED SPECTROSCOPY (FTIR); OPTICAL-; SILICON DIOXIDES; SILICON OXIDE;

CARBON FILMS;

EID: 50849140170     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.05.022     Document Type: Article

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