Low dielectric constant films prepared by plasma-enhanced chemical vapor deposition from tetramethylsilane

Journal of Applied Physics

Volumn 85, Issue 6, 1999, Pages 3314-3318

  Grill, A ^a   Patel, V ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001184373     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.369677     Document Type: Article

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