Role of carbon atoms in the remote plasma deposition of hydrogenated amorphous carbon

Journal of Applied Physics

Volumn 94, Issue 10, 2003, Pages 6932-6938

  Benedikt, J ^a   Wisse, M ^a,b   Woen, R V ^a   Engeln, R ^a   Van de Sanden, M C M ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b VU UNIVERSITY AMSTERDAM   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; ACETYLENE; ARGON; CARBON; ELECTRON TRANSITIONS; FILM GROWTH; GROUND STATE; HYDROGENATION; PLASMA THEORY; PLASTIC FILMS;

GAS INJECTION RINGS;

AMORPHOUS MATERIALS;

EID: 0344084097     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1622116     Document Type: Article

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