On the hexamethyldisiloxane dissociation paths in a remote Ar-fed expanding thermal plasma

Plasma Sources Science and Technology

Volumn 15, Issue 3, 2006, Pages 421-431

  Creatore, M ^a   Barrell, Y ^a   Benedikt, J ^a   Van De Sanden, M C M ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; DISSOCIATION; ION EXCHANGE; IONIZATION; MASS SPECTROMETRY; POLYSILICON;

CHARGE EXCHANGE; HEXAMETHYLDISILOXANE (HMDSO); OLIGOMERIZATION; THERMAL PLASMAS;

PLASMAS;

EID: 33745619604     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/15/3/018     Document Type: Article

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