SCOPUS 정보 검색 플랫폼

Journal of Applied Physics

Volumn 84, Issue 5, 1998, Pages 2426-2435

Plasma chemistry aspects of a-Si:H deposition using an expanding thermal plasma

(5) Van De Sanden, M C M a Severens, R J a Kessels, W M M a Meulenbroeks, R F G a Schram, D C a

a EINDHOVEN UNIVERSITY OF TECHNOLOGY (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001019934 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.368977 Document Type: Article

Times cited : (127)

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