Gas cluster ion beam equipment and applications for surface processing

IEEE Transactions on Plasma Science

Volumn 36, Issue 4 PART 2, 2008, Pages 1471-1488

  Toyoda, Noriaki ^a   Yamada, Isao ^a,b  

^a UNIVERSITY OF HYOGO   (Japan)

^b KYOTO UNIVERSITY   (Japan)

Author keywords

Ion beam applications; Ion beams; Ion sources; Surface treatment

Indexed keywords

APPLICATIONS; ATOMIC PHYSICS; ATOMS; BEAM PLASMA INTERACTIONS; COMPUTER NETWORKS; ELECTROMAGNETIC WAVES; EQUIPMENT; GASES; INDUSTRIAL APPLICATIONS; ION BEAMS; ION BOMBARDMENT; ION SOURCES; IONIZATION OF GASES; IONS; IRRADIATION; MONOMERS; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SILICON WAFERS; SPUTTERING;

GAS CLUSTERS; ION BEAM APPLICATIONS; SURFACE TREATMENT;

ION BEAM ASSISTED DEPOSITION;

EID: 50649086336     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2008.927266     Document Type: Article

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