Atomic level smoothing of CVD diamond films by gas cluster ion beam etching

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 112, Issue 1-4, 1996, Pages 248-251

  Yoshida, Akihisa ^a   Deguchi, Masahiro ^a   Kitabatake, Makoto ^a   Hirao, Takashi ^a   Matsuo, Jiro ^b   Toyoda, Noriaki ^b   Yamada, Isao ^b  

^a PANASONIC CORPORATION   (Japan)

^b KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; DIAMOND FILMS; ETCHING; SEMICONDUCTOR DEVICE MANUFACTURE; SUBSTRATES;

ATOMIC LEVEL SMOOTHING; GAS CLUSTER ION BEAM ETCHING; SILICON SUBSTRATES;

ION BEAM LITHOGRAPHY;

EID: 0030563228     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/0168-583X(95)01007-6     Document Type: Article

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