Fluoride thin film formation with low optical absorption by gas cluster ion beam assisted deposition

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 261, Issue 1-2 SPEC. ISS., 2007, Pages 656-659

  Nakazawa, S ^a   Toyoda, N ^a   Mochiji, K ^a   Mitamura, T ^a   Yamada, I ^a  

^a UNIVERSITY OF HYOGO   (Japan)

Author keywords

Fluoride film; Gas cluster ion beam; Optical thin film

Indexed keywords

FLUORIDE FILMS; GAS CLUSTER ION BEAMS; LOW ENERGY IRRADIATION EFFECTS; OPTICAL THIN FILMS;

CRYSTALLINE MATERIALS; FLUORIDE MINERALS; ION BEAMS; ION BOMBARDMENT; LIGHT ABSORPTION; SURFACE ROUGHNESS;

THIN FILMS;

EID: 34447289459     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2007.04.267     Document Type: Article

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