Copper interactions with H, O, and the self-interstitial in silicon

Physical Review B - Condensed Matter and Materials Physics

Volumn 68, Issue 3, 2003, Pages 352101-352107

  West, D ^a   Estreicher, S K ^a   Knack, S ^b   Weber, J ^b  

^a TEXAS TECH UNIVERSITY   (United States)

^b DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; HYDROGEN; OXYGEN; SILICON;

ARTICLE; CALCULATION; CHEMICAL STRUCTURE; COVALENT BOND; DISSOCIATION; ENERGY; MOLECULAR DYNAMICS; MOLECULAR MODEL; SIMULATION; TEMPERATURE; VIBRATION;

EID: 5044235204     PISSN: 10980121     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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