Influence of ion-bombardment-energy on thin zirconium oxide films prepared by dual frequency oxygen plasma sputtering

Surface and Coatings Technology

Volumn 201, Issue 15, 2007, Pages 6627-6630

  Ohtsu, Y ^a   Hino, Y ^a   Misawa, T ^a   Fujita, H ^a   Yukimura, K ^b   Akiyama, M ^c  

^a SAGA UNIVERSITY   (Japan)

^b DOSHISHA UNIVERSITY   (Japan)

^c NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Dual frequency plasma sputtering; Ion bombardment; Zirconium oxide

Indexed keywords

CERAMIC COATINGS; CONTACT ANGLE; HARDNESS; ION BOMBARDMENT; PLASMA APPLICATIONS; SPUTTERING; THIN FILMS; WEAR RESISTANCE;

DUAL FREQUENCY PLASMA SPUTTERING; WEAR RESISTANCE COATING;

ZIRCONIA;

CERAMIC COATINGS; CONTACT ANGLE; HARDNESS; ION BOMBARDMENT; PLASMA APPLICATIONS; SPUTTERING; THIN FILMS; WEAR RESISTANCE; ZIRCONIA;

EID: 33847384152     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.09.015     Document Type: Article

References (15)

1. Ryshkewitz E., and Richardson D.W. Oxide Ceramics Physical Chemistry and Technology (1985), General Ceramics, Haskell, NJ
2. Venkataraj S., Kappertz O., Weis H., Drese R., Jayavel R., and Wutting M. J. Appl. Phys. 92 (2002) 3599
3. Lowdermil W.H., Milam D., and Rainer F. Thin Solid Films 73 (1980) 155
4. Ahn H., Kim J., and Lim D. Wear 203-204 (1997) 77
5. Kuwata K. Annual Report (2000), Saga Ceramics Research Laboratory (in Japanese)
6. Ohtsu Y., Egami M., Fujita H., and Yukimura K. Surf. Coat. Technol. 196 (2005) 81
7. Wang L.S., and Barnett S.A. J. Electrochem. Soc. 139 (1992) 1134
8. Hartmanova M., Gmucova K., and Thurzo I. Solid State Ionics 130 (2000) 105
9. Takagi T. Thin Solid Films 92 (1982) 1
10. Weissmantel C., Bewilogua K., Dietrich D., Erler H.J., Hinneberg H.J., Klose S., Nowick W., and Reisse G. Thin Solid Films 72 (1980) 19
11. Martin P.J., Netterfield R.P., and Sainty W.G. J. Appl. Phys. 55 (1983) 235
12. Chen F.F. In: Huddlestone R.H., and Leonard S.L. (Eds). Plasma Diagnostics Techniques (1965), Academic Press, New York Ch.4.
13. Lieberman M.A., and Lichtenberg A.J. Principle of Plasma Discharge and Materials Processing (1994), John and Wiley, New York
14. Davis C.A. Thin Solid Films 226 (1993) 30
15. Zhang Y.B., Lau S.P., Sheeja D., and Tay B.K. Surf. Coat. Technol. 195 (2005) 338