Effect of the substrate temperature on the structure and properties of Al2O3 layers reactively deposited by pulsed magnetron sputtering

Surface and Coatings Technology

Volumn 82, Issue 1-2, 1996, Pages 169-175

  Zywitzki, O ^a   Hoetzsch, G ^a   Fietzke, F ^a   Goedicke, K ^a  

^a Fraunhofer Institute for Electron Beam and Plasma Technology   (Germany)

Author keywords

Alumina coatings; Mechanical properties; Pulsed magnetron sputtering; Structure

Indexed keywords

AMORPHIZATION; COATINGS; HARDNESS; MAGNETRON SPUTTERING; MICROSTRUCTURE; RESIDUAL STRESSES; SUBSTRATES; THERMAL EFFECTS;

ALUMINA COATINGS;

ALUMINA;

EID: 0030193122     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/0257-8972(95)00270-7     Document Type: Article

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