Localized epitaxial growth of α-Al2O3 thin films on Cr2O3 template by sputter deposition at low substrate temperature

Applied Physics Letters

Volumn 82, Issue 7, 2003, Pages 1024-1026

  Jin, P ^a   Nakao, S ^a   Wang, S X ^b,c   Wang, L M ^b  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b UNIVERSITY OF MICHIGAN   (United States)

^c MICRON TECHNOLOGY INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; CHROMIUM COMPOUNDS; EPITAXIAL GROWTH; GLASS; LOW TEMPERATURE EFFECTS; OPTIMIZATION; SPUTTER DEPOSITION; STOICHIOMETRY; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

HIGH-RESOLUTION TRANSMISSION ELECTRON MICROSCOPY (HRTEM);

THIN FILMS;

EID: 0037450221     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1544442     Document Type: Article

References (13)

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