Deposition and field emission properties of highly crystallized silicon films on aluminum-coated polyethylene napthalate

Journal of Crystal Growth

Volumn 306, Issue 1, 2007, Pages 1-5

  Li, Junshuai ^a,b   Wang, Jinxiao ^a   Yin, Min ^a   Gao, Pingqi ^a   He, Deyan ^a   Chen, Qiang ^b   Shirai, Hajime ^b  

^a LANZHOU UNIVERSITY   (China)

^b SAITAMA UNIVERSITY   (Japan)

Author keywords

A1. Atomic force microscopy; A1. Crystal morphology; A1. Surface structure; A3. Inductively coupled plasma CVD; B2. Si films; B3. Field emission

Indexed keywords

ALUMINUM-COATED POLYETHYLENE NAPTHALATE; CRYSTAL MORPHOLOGY; SILICON FILM CRYSTALLINITY;

ATOMIC FORCE MICROSCOPY; CRYSTALLIZATION; FIELD EMISSION; INDUCTIVELY COUPLED PLASMA; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING SILICON;

THIN FILMS;

EID: 34447526305     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2007.04.057     Document Type: Article

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