Amorphous oxide channel TFTs

Thin Solid Films

Volumn 516, Issue 7, 2008, Pages 1516-1522

  Kumomi, Hideya ^a   Nomura, Kenji ^b   Kamiya, Toshio ^b   Hosono, Hideo ^b,c  

^a CANON INC   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Amorphous; Oxides; Semiconductors; TFT; Transparent

Indexed keywords

AMORPHOUS MATERIALS; ANNEALING; FIELD EFFECT TRANSISTORS; MAGNETRON SPUTTERING; ORGANIC LIGHT EMITTING DIODES (OLED); SPUTTER DEPOSITION;

AMORPHOUS OXIDE CHANNEL; CHANNEL MATERIALS; FLEXIBLE ELECTRONICS; GATE INSULATOR LAYERS;

THIN FILM TRANSISTORS;

EID: 38649107109     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.03.161     Document Type: Article

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