Low angle forward reflected neutral beam source and its applications

Journal of Physics D: Applied Physics

Volumn 41, Issue 2, 2008, Pages

  Park, B J ^a   Kim, S W ^a   Kang, S K ^a   Min, K S ^a   Park, S D ^a   Kyung, S J ^a   Lee, H C ^a   Bae, J W ^a   Lim, J T ^a   Lee, D H ^c   Yeom, G Y ^a,b  

^a Sungkyunkwan University   (South Korea)

^b National Program for Tera Level Devices   (South Korea)

^c SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ETCHING; FIELD EMISSION; GATE DIELECTRICS; MOS DEVICES; SURFACE TREATMENT;

NEUTRAL BEAM ETCHING; SEMICONDUCTOR INDUSTRY; SURFACE NEUTRALIZATION;

PARTICLE BEAMS;

EID: 38049003569     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/41/2/024005     Document Type: Article

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