Quantifying via charging currents

International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings

Volumn , Issue , 1997, Pages 123-126

  Lukaszek, Wes ^a   Shields, Jeffrey ^a   Birrell, Andrew ^a  

^a Wafer Charging Monitors Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; CHARGE CARRIERS; CURRENT DENSITY; ELECTRIC CURRENTS; MASKS; PHOTORESISTS;

CHARGING DAMAGE; CHARM 2 WAFERS;

PLASMA ETCHING;

EID: 0030644691     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)