Damage during SiO2 etching by low-angle forward reflected neutral beam

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 41, Issue 12 A, 2002, Pages

  Lee, Dohaing ^a   Chung, Minjae ^a   Park, Sangduk ^a   Yeom, Geunyoung ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

Etching; Low damage; Low angle reflection; Neutral beam; SiO2

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; FAILURE ANALYSIS; ION SOURCES; PHOTORESISTS; PLASMA ETCHING;

LOW ANGLE REFLECTION; LOW DAMAGE; NEUTRAL BEAM;

SILICA;

EID: 0036973855     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.l1412     Document Type: Letter

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