Removal of aspect-ratio-dependent etching by low-angle forward reflected neutral-beam etching

Journal of the Korean Physical Society

Volumn 46, Issue 4, 2005, Pages 867-871

  Lee, Do Haing ^a   Park, Byoung Jae ^a   Yeom, Geun Young ^a   Kim, Sung Jin ^b   Lee, Jae Koo ^b   Baek, Kye Hyun ^c   Kang, Chang Jin ^c  

^a Sungkyunkwan University   (South Korea)

^b Pohang University of Science and Technology (POSTECH)   (South Korea)

^c Samsung Advanced Institute of Technology (SAIT)   (South Korea)

Author keywords

Low angle surface reflection; Neutral beam etching; RIE lag

Indexed keywords

EID: 17744383019     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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