Formation of high flux parallel neutral beam using a three grid system of ion beam during low angle forward reflection of ions

Solid State Phenomena

Volumn 124-126, Issue PART 1, 2007, Pages 275-278

  Park, Byoung Jae ^a   Min, Kyoung Seok ^a   Park, Sang Duk ^a   Bae, Jeong Woon ^a   Vozniy, Oleksiy ^a   Yeom, Geun Young ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

Grid system; High beam flux; Low energy; Nano scale etch; Neutral beam etching

Indexed keywords

ANGLE MEASUREMENT; ION SOURCES; LIGHT REFLECTION; MAGNETIC FLUX; NANOTECHNOLOGY;

GRID SYSTEMS; HIGH BEAM FLUX; NANO-SCALE ETCH; NEUTRAL BEAM ETCHING;

ION BEAMS;

EID: 38049039791     PISSN: 10120394     EISSN: None     Source Type: Book Series    
DOI: 10.4028/3-908451-31-0.275     Document Type: Conference Paper

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