Progress in discharge plasma simulation of planar DC magnetron sputtering

Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology

Volumn 27, Issue 6, 2007, Pages 493-499

  Qiu, Qingquan ^a   Li, Qingfu ^a   Su, Jingjing ^a   Yu, Jiao ^b   Jim, Finely ^b  

^a XI'AN JIAOTONG UNIVERSITY   (China)

^b PPG INDUSTRIES   (United States)

Author keywords

DC; Discharge; Magnetic field; Magnetron sputtering; Plasma; Simulation

Indexed keywords

MAGNETIC FIELDS; MAGNETRON SPUTTERING; THREE DIMENSIONAL; TWO DIMENSIONAL;

DC MAGNETRON SPUTTERING; DISCHARGE PLASMA SIMULATION;

PLASMA SIMULATION;

EID: 37449028703     PISSN: 16727126     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Review

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