Effect of wall conditions on the self-limiting deposition of metal oxides by pulsed plasma-enhanced chemical vapor deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 25, Issue 6, 2007, Pages 1493-1499

  Szymanski, Scott F ^a   Seman, Michael T ^a,b   Wolden, Colin A ^a  

^a Department of Geology and Geological Engineering   (United States)

^b CMD Research LLC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FILM QUALITY; METAL OXIDES; QUADRUPOLE MASS SPECTROMETRY;

ADSORPTION; DEPOSITION; MASS SPECTROMETRY; OPTICAL EMISSION SPECTROSCOPY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

OXIDES;

EID: 36048940102     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2779039     Document Type: Article

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