Pulsed radio frequency plasma deposition of a-SiNx: H alloys: Film properties, growth mechanism, and applications

Journal of Applied Physics

Volumn 100, Issue 6, 2006, Pages

  Vernhes, R ^a   Zabeida, O ^a   Klemberg Sapieha, J E ^a   Martinu, L ^a  

^a ÉCOLE POLYTECHNIQUE DE MONTRÉAL   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; FILM GROWTH; OPTICAL PROPERTIES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RADIO BROADCASTING; SILICON NITRIDE;

FABRICATION PROCESSES; FILM PROPERTIES; PULSED RADIO FREQUENCY PLASMA DEPOSITION; SPECTROSCOPIC ELLIPSOMETRY ANALYSIS;

SILICON ALLOYS;

EID: 33749395150     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2349565     Document Type: Article

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